Schematic image of the basic steps for creating ordered silicon nanostructures through a mask of polystyrene nanospheres using the nanosphere lithography process ...

With the increasing functional demands of micro- and nano-devices, there is a growing need for complex micro/nano-architectures featuring high spatial resolution and tunable depth profiles.

Nanoimprint Lithography (NIL) is a nanoscale fabrication technique in which patterns are transferred from a pre-fabricated mold into a deformable resist through direct mechanical contact. The ...

Planar cross-scale structures encode position and posture, enabling nanometer-level accuracy and multi-scale cascaded precision, emerging as a potential sensing device for semiconductor manufacturing ...