TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
Dai Nippon Printing Co., Ltd. (DNP, TOKYO:7912) today announced the development of a nanoimprint lithography (NIL) template featuring a circuit line width of 10 nanometers (nm: 10-9 meter). The new ...
Mycronic AB ( ($SE:MYCR) ) has issued an update. Mycronic has secured a USD 5–7 million order from a new Asian customer for its SLX laser mask ...
Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...
In future high-tech industries, such as high-speed optical computing for massive AI, quantum cryptographic communication, and ...
In a joint research team project with POSTECH (Pohang University of Science and Technology) the Korea Advanced Institute of ...
KAIST announced on January 6th that a joint research team, led by Professor Ji Tae Kim from the Department of Mechanical ...
Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for ...
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