Nano-electronics research center imec and Nova Measuring Instruments (Nasdaq: NVMI), a leading innovator and key provider of metrology solutions for advanced process control used in semiconductor ...
Advanced logic scaling has created some difficult technical challenges, including a requirement for highly dense patterning. Imec recently confronted this challenge, by working toward the use of Metal ...
The recent San Francisco Bay Area Council IEEE Nanotechnologyconference addressed the issue of nanoelectronics forsub-20-nm processes. The speakers—from Applied Materials,TSMC (Taiwan Semiconductor ...
As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and ...
Leuven, Belgium, and San Jose, CA. Nano-electronics research center imec and Cadence Design Systems Inc. today announced that the companies completed the first tapeout of a 5-nm test chip using ...
In a development that could reshape the global semiconductor race, Huawei filed a patent outlining a path to 2 nm-class chip production using only deep-ultraviolet (DUV) lithography tools – the very ...
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