Applied Materials, Inc. said today that it has developed a dry chemical process to replace conventional plasma-based sputter etch technology used in the fabrication of transistor contacts. The Applied ...

All variants of dry etching processes use plasma, which is why dry etching is often referred to as plasma etching. Ion milling and sputter etching use a beam of ions to eject or vaporize material ...

Configuration of Thin Film Deposition Sputter Systems It is possible to configure thin film deposition sputter systems with many different hardware or software options, which include substrate pre ...

Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...

Taiwan-based UVAT Technology with its sputtering and etching equipment has obtained new orders for fan-out panel-level packaging, as well as orders for the manufacture of high-end substrates such as ...

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What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

Plasma etching is perhaps the most essential process in semiconductor manufacturing, and possibly the most complex of all fab operations next to photolithography. Nearly half of all fab steps rely on ...